SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 141, Issue 2-3, 2001, Pages 145-155

Microstructure, mechanical properties, and wetting behavior of Si-C-N thin films grown by reactive magnetron sputtering

(4) Berlind, Torun a Hellgren, Niklas a Johansson, Mats P a Hultman, Lars a

a LINKÖPING UNIVERSITY (Sweden)

Author keywords

Magnetron sputtering; Properties; Silicon carbon nitride thin films

Indexed keywords

CHEMICAL BONDS; CONTACT ANGLE; ENERGY DISPERSIVE SPECTROSCOPY; GLYCEROL; MAGNETRONS; MICROSTRUCTURE; POLYTETRAFLUOROETHYLENES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM SURFACE ENERGY;

COATINGS;

COATING; FILM; MICROSTRUCTURE; SPUTTERING; TRIBOLOGY;

EID: 0035907527 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01236-1 Document Type: Article

Times cited : (102)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.