Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

Diamond and Related Materials

Volumn 15, Issue 10, 2006, Pages 1650-1658

  Blaszczyk Lezak, I ^a   Wrobel, A M ^a   Bielinski, D M ^b  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

^b LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Density; Mechanical properties; Refractive index; Silicon carbonitride film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELASTIC MODULI; FRICTION; REFRACTIVE INDEX; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

(DIMETHYLAMINO)DIMETHYLSILANE PRECURSOR; AMORPHOUS HYDROGENATED SILICON CARBONITRIDE (A-SI:C:N:H) FILMS; REMOTE HYDROGEN PLASMA CHEMICAL VAPOR DEPOSITION (RP-CVD);

SILICON COMPOUNDS;

EID: 33748759868     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.01.019     Document Type: Article

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