Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 742-746

  Shimojo, M ^a,b   Mitsuishi, K ^a   Tameike, A ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; DECOMPOSITION; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON EMISSION; ENERGY DISPERSIVE SPECTROSCOPY; FIELD EMISSION MICROSCOPES; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SEPARATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

ELECTRON BEAM INDUCED CHEMICAL VAPOR DEPOSITION (EBI-CVD); FIELD-EMISSION GUN SCANNING ELECTRON MICROSCOPE (FE-SEM); FOCUSED ION BEAMS; PROBE SIZE;

NANOSTRUCTURED MATERIALS;

EID: 2342616801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1688349     Document Type: Article

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