Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 742-746

  Shimojo, M ^a,b   Mitsuishi, K ^a   Tameike, A ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b Prec and Intelligence Laboratory ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; DECOMPOSITION; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON EMISSION; ENERGY DISPERSIVE SPECTROSCOPY; FIELD EMISSION MICROSCOPES; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SEPARATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

ELECTRON BEAM INDUCED CHEMICAL VAPOR DEPOSITION (EBI-CVD); FIELD-EMISSION GUN SCANNING ELECTRON MICROSCOPE (FE-SEM); FOCUSED ION BEAMS; PROBE SIZE;

NANOSTRUCTURED MATERIALS;

EID: 2342616801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1688349     Document Type: Article

References (23)

1. J. J. Boland, Science 262, 5140 (1993); 262, 1703 (1993).
2. J. J. Boland, Science 262, 5140 (1993); 262, 1703 (1993).
3. L. J. Whitman, J. A. Stroscio, R. A. Dragoset, and R. J. Celotta, Science 251, 1206 (1991).
4. K. L. Bjorklund, P. Heszler, and M. Boman, Appl. Surf. Sci. 186, 179 (2002).
5. D. Tonneau, F. Thuron, A. Correia, J. E. Bouree, and Y. Pauleau, Jpn. J. Appl. Phys. 37, 4954 (1998).
6. A. J. DeMarco and J. Melngailis, J. Vac. Sci. Technol. B 17, 3154 (1999).
7. D. K. Stewart, J. A. Morgan, and B. Ward, J. Vac. Sci. Technol. B 9, 2670 (1991).
8. S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda, and Y. Haruyama, J. Vac. Sci. Technol. B 18, 3181 (2000).
9. I. Utke, P. Hoffmann, B. Dwir, K. Leifer, E. Kapon, and P. Doppelt, J. Vac. Sci. Technol. B 18, 3168 (2000).
10. A. Folch, J. Tejada, C. H. Peters, and M. S. Wrighton, Appl. Phys. Lett. 66, 2080 (1995).
11. K. T. Kohlmann-von Platen, L.-M. Buchmann, H.-C. Petzold, and W. H. Brunger, J. Vac. Sci. Technol. B 10, 2690 (1992).
12. K. T. Kohlmann-von Platen, J. Chiebek, M. Weiss, K. Reimer, H. Oertel, and W. H. Brunger, J. Vac. Sci. Technol. B 11, 2219 (1993).
13. H. W. P. Koops, C. Schossler, A. Kaya, and M. Weber, J. Vac. Sci. Technol. B 14, 4105 (1996).
14. H. W. P. Koops, A. Kaya, and M. Weber, J. Vac. Sci. Technol. B 13, 2400 (1995).
15. A. Ishibashi, K. Funato, and Y. Mori, J. Vac. Sci. Technol. B 9, 169 (1991).
16. S. Matsui and T. Ichihashi, Appl. Phys. Lett. 53, 842 (1988).
17. N. A. Kislov, I.I. Rhodos, E. D. Ivanov, and J. Barthel, Scanning 18, 114 (1996).
18. K. Mitsuishi, M. Shimojo, M. Han, M. Takeguohi, M. Tanaka, M. Song, and K. Furuya (unpublished).
19. T. E. Allen, R. R. Kunz, and T. M. Mayer, J. Vac. Sci. Technol. B 6, 2057 (1988).
20. T. Ifuku, M. Otobe, A. Itoh, and S. Oda, Jpn. J. Appl. Phys., Part 1 36, 4031 (1997).
21. A. Dutta, S. Oda, Y. Fu, and M. Willander, Jpn. J. Appl. Phys., Part 1 39, 4647 (2000).
22. Introduction to Analytical Electron Microscopy, edited by J. J. Hren, J. I. Goldstein, and D. C. Joy (Plenum, New York, 1979), pp. 101-103.
23. T. Koshikawa and R. Shimizu, J. Phys. D 7, 1303 (1974).