Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1562-1569

  Tatsumi, T ^a   Hikosaka, Y ^a   Morishita, S ^a   Matsui, M ^a   Sekine, M ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347756625     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582102     Document Type: Article

References (17)

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