Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection

Applied Physics Letters

Volumn 84, Issue 23, 2004, Pages 4708-4710

  Hiramatsu, M ^a   Shiji, K ^a   Amano, H ^a   Hori, M ^b  

^a MEIJO UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBON NANOTUBES; FABRICATION; HYDROGENATION; MORPHOLOGY; NUCLEATION; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICA;

CAPACITIVELY COUPLED PLASMA (CCP); CARBON NANOWALLS; NANOFIBERS; RADICAL INJECTION;

NANOSTRUCTURED MATERIALS;

EID: 3042635867     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1762702     Document Type: Article

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