Surface reaction of CF2 radicals for fluorocarbon film formation in SiO2/Si selective etching process

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 233-238

  Inayoshi, Muneto ^a   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a   Hiramatsu, Mineo ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b MEIJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032358625     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580977     Document Type: Article

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