Study on polymeric neutral species in high-density fluorocarbon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 1-9

  Ishii, Nobuo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRON CYCLOTRON RESONANCE; ELECTRON ENERGY LEVELS; HYDROGEN; MASS SPECTROMETRY; NEGATIVE IONS; PLASMA DENSITY; PLASMA ETCHING; PLASMA POLYMERIZATION; REACTION KINETICS; REACTIVE ION ETCHING;

HIGH DENSITY PLASMA; QUADRUPOLE MASS SPECTROMETER;

FLUOROCARBONS;

EID: 0033692025     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582150     Document Type: Article

References (2)

1. M. Haverlag, W. W. Stoffels, E. Stoffels, G. M. W. Kroesen, and F. J. de Hoog, J. Vac. Sci. Technol. A 14, 384 (1996).
2. N. E. Capps, N. M. Mackie, and E. R. Fisher, J. Appl. Phys. 84, 4736 (1998).