A diode laser and modeling study of mixed (CH4-H2-O2) AC plasmas

Journal of Physical Chemistry A

Volumn 103, Issue 20, 1999, Pages 4118-4128

  Fan, W Y ^a,b   Knewstubb, P F ^a   Kaning M ^a,c   Mechold, L ^a,c   Ropcke J ^a,c   Davies, P B ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c Inst Niedertemperatur Plasmaphys   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001222690     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp984570l     Document Type: Article

References (26)

1. Angus, J. C.; Koidl, P.; Dorritz, S. Plasma Deposited Thin Films; Mort, J., Jansen, F., Eds.; CRC Press: Boca Raton, 1986.
2. Konuma, M. Film Deposition by Plasma Techniques; Springer-Verlag: Berlin, 1992.
3. Fan, W. Y.; Röpcke, J.; Davies, P. B. J. Vac. Sci. Technol. A. 1996, 14, 2970.
4. Yalamanchi, R. S.; Harshavardhan, K. S. J. Appl. Phys. 1990, 68, 5941.
5. Hirose, Y.; Amanuma, S.; Komaki, K. J. Appl. Phys. 1990, 68, 6401.
6. Yamada, C.; Hirota, E.; Kawaguchi, K. J. Chem. Phys. 1981, 75, 5256.
7. Davies, P. B.; Martineau, P. M. Appl. Phys. Lett. 1990, 57, 237.
8. Okeke, L.; Stori, H. Plasma Chem. Plasma Proc. 1991, 11, 489.
9. Röpeke, J.; Mechold, L.; Käning, M.; Fan, W. Y.; Davies, P. B. Plasma Chem. Plasma Process. 1999, 19, 395.
10. Davies, P. B.; Martineau, P. M. J. Appl. Phys. 1992, 71, 6125.
11. Herzberg, G. Molecular Spectra and Molecular Structure, Vol. II: Infrared and Roman Spectra of Polyatomic Molecules; Van Nostrand Reinhold Co.: New York, 1945.
12. Haverlag, M.; Stoeffels, E.; Stoeffels, W. W.; Kroesen, G. M. W.; De Hoog, F. J. J. Vac. Sci. Technol. A. 1996, 14, 380.
13. Holbrook, K. A.; Pilling, M. J.; Robertson, S. H. Unimolecular Reactions, 2nd ed.; Wiley and Sons: New York, 1996.
14. Yamada, C.; Hirota, E. J. Chem. Phys. 1983, 78, 669.
15. Kline, L. E.; Partlow, W. D.; Bies, W. E. J. Appl. Phys. 1989, 65, 70.
16. Semaniak, J.; Larson, A.; Le Padellec, A.; Stromholm, C.; Larsson, M.; Rosen, S.; Peverall, R.; Danared, H.; Djuric, N.; Dunn, G. H.; Datz, S. Astrophys. J. 1998, 498, 886.
17. Gogolides, E.; Mary, D.; Rhallabi, A.; Turban, G. Jpn. J. Appl. Phys. 1995, 34, 261.
18. Sugai, H.; Toyoda, H. J. Vac Sci. Technol A. 1992, 10, 1193.
19. FACSIMILE manual; AEA Technology Harwell, 3rd ed., 1995.
20. Moller, W. Appl. Phys. A 1993, 56, 527.
21. Grill, A. Cold Plasmas in Materials Fabrication: front fundamentals to applications; IEEE Press: Piscataway, NJ, 1994.
22. Baulch, D. L.; Cobos, C. J.; Cox, R. A.; Esser, C.; Frank, P.; Jut, Th.; Kerr, J. A.; Pilling, M. J.; Troe, J.; Walker, R. W.; Warnatz, J. J. Phys. Chem. Ref. Data, 1992, 21, 411.
23. Nakano, T.; Toyoda, H.; Sugai, H. Jpn. J. Appl. Phys. 1991, 30, 2908.
24. Cali, F. A.; Herbert, P. A. F.; Kelly, W. M. J. Vac. Sci. Technol A 1995, 13, 2920.
25. Dagel, D. J.; Mallouris, C. M.; Doyle, J. R. J. Appl. Phys. 1996, 79, 11.
26. Sugai, H.; Kojima, H.; Ishida, A.; Toyoda, H. Appl Phys. Lett. 1990, 56, 2616.