Tunable diode laser diagnostic studies of H2-Ar-O2 microwave plasmas containing methane or methanol

Plasma Chemistry and Plasma Processing

Volumn 19, Issue 3, 1999, Pages 395-419

  Ropcke J ^a   Mechold, L ^a   Kaning M ^a   Fan, W Y ^b   Davies, P B ^b  

^a Inst Niedertemperatur Plasmaphys   (Germany)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

CH2O; CH3; HCOOH; Laser diagnostics; Methane; Methanol; Microwave plasma; Plasma chemistry; TDLAS

Indexed keywords

EID: 0033474404     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021872420200     Document Type: Article

References (59)

1. G. Herzberg and J. Shoosmith, Can. J. Phys. 34, 523 (1956).
2. G. Herzberg, Proc. Roy. Soc. A 262, 291 (1961).
3. L. Y. Tan, A. M. Winer, and G. C. Pimentel, J. Chem. Phys. 57, 4028 (1972).
4. C. Yamada, E. Hirota, and K. Kawaguchi, J. Chem. Phys. 75, 5256 (1981).
5. T. Amano, P. F. Bernath, C. Yamada, Y. Endo, and E. Hirota, J. Chem. Phys. 77, 5284 (1982).
6. C. Yamada and E. Hirota, J. Chem. Phys. 78, 669 (1983).
7. G. A. Laguna and S. L. Baughcum, Chem. Phys. Lett. 88, 568 (1982).
8. G. A. Bethardy and R. G. Macdonald, J. Chem. Phys. 103, 2863 (1995).
9. G. A. Bethardy, F. J. Northrup, and R. G. Macdonald, J. Chem. Phys. 105, 5433 (1996).
10. D. F. Davidson, M. D. Di Rosa, E. J. Chang, and R. K. Hanson, J. Quant. Spectrosc. Radiat. Transfer 53, 581 (1995).
11. D. H. Fairbrother, K. A. Briggman, K. A. Dickens, P. C. Stair, and E. Weitz, Rev. Sci. Instrument 68, 2031 (1997).
12. G. N. Robinson, M. S. Zahniser, A. Freedman, and D. D. Nelson Jr., J. Mol. Spectr. 176, 337 (1996).
13. T. Takayanagi, J. Chem. Phys. 104, 2237 (1996).
14. K. Tachibana, M. Nishida, H. Harima, and Y. Urano, J. Phys. D: Appl. Phys. 17, 1727 (1984).
15. F. G. Celii, P. E. Pehrsson, H.-T. Wang, and J. E. Butler, Appl. Phys. Lett. 52, 2043 (1988).
16. J. Wormhoudt, J. Vacuum Sci. Technol. A 8, 1722 (1990).
17. J. Wormhoudt and K. E. McCurdy, Chem. Phys. Lett. 156, 47 (1989).
18. P. B. Davies and P. M. Martineau, Appl. Phys. Lett. 57, 237 (1990).
19. P. B. Davies and P. M. Martineau, J. Appl. Phys. 71, 6125 (1992).
20. P. B. Davies and P. M. Martineau, Adv. Mater. 4, 729 (1992).
21. M. Ikeda, K. Aiso, M. Hori, and T. Goto, Jpn. J. Appl. Phys. 34, 3273 (1995).
22. S. Naito, N. Ito, T. Hattori, and T. Goto, Jpn. J. Appl. Phys. 34, 302 (1995).
23. M. Ikeda, M. Hori, T. Goto, M. Inayoshi, K. Yamada, M. Hiramatsu, and M. Nawata, Jpn. J. Appl. Phys. 34, 2484 (1995).
24. S. Naito, N. Ito, T. Hattori, and T. Goto, Jpn. J. Appl. Phys. 33, 5967 (1994).
25. S. Naito, M. Ikeda, N. Ito, T. Hattori, and T. Goto, Jpn. J. Appl. Phys. 32, 5721 (1993).
26. M. Ikeda, N. Ito, M. Hiramatsu, M. Hori, and T. Goto, J. Appl. Phys. 82, 4055 (1997).
27. S. Kim, D. P. Billesbach, and R. Dillon, J. Vacuum Sci. Technol. A 15, 2247 (1997).
28. A. Ohl, Large Area Planar Microwave Discharges, in Microwave Discharges: Fundamentals and Applications, C. M. Ferreira, ed., Plenum, New York (1993), p. 205.
29. A. Ohl and J. Röpcke, Diamond Related Mater. I, 243 (1992).
30. A. Ohl, J. Röpcke, and W. Schleinitz, Diamond Related Mater. 2, 298 (1993).
31. J. Röpcke, A. Ohl, and M. Schmidt, J. Anal. Spectr. 8, 803 (1993).
32. A. Ohl, H. Strobel, J. Röpcke, H. Kammerstetter, A. Pries, and M. Schneider, Surface Coatings Technol. 74-75, 59 (1995).
33. D. Keller, K. Schröder, B. Husen, and A. Ohl, Polymer Preprints 38, 1043 (1997).
34. A. Ohl, Journal de Physique IV 8, 83 (1998).
35. L. S. Rothman et al., J. Quant. Spectros. Radiat. Transfer 48, 469 (1992).
36. G. Guelachvili and K. N. Rao, Handbook of Infrared Standards, Academic Press, Orlando (1986).
37. N. Husson et al., J. Quant. Spectros. Radiat. Transfer 52, 425 (1994).
38. W. Y. Fan, J. Röpcke, and P. B. Davies, J. Vacuum Sci. Technol. A 14, 2970 (1996).
39. J. Röpcke, M. Käning, and B. P. Lavrov, Journal de Physique IV 8, 207 (1998).
40. S. A. Astashkevich, M. Käning, E. Käning, N. V. Kokina, B. P. Lavrov, A. Ohl, and J. Röpcke, J. Quant. Spectrosc. Radiat. Transfer 56, 725 (1996).
41. J. Röpcke, B. P. Lavrov, and A. Ohl, Frontiers in Low Temperature Plasma Diagnostics II, Bad Honnef, Book of Papers (1997), p. 201.
42. B. P. Lavrov, M. Käning, V. L. Ovtchinnikov, and J. Kopeke, Frontiers in Low Temperature Plasma Diagnostics II, Bad Honnef, Book of Papers, (1997), p. 169.
43. H. F. Winters, J. Chem. Phys. 63, 3462 (1975).
44. S. Bohr, R. Haubner, and B. Lux, Appl. Phys. Lett. 68, 1075 (1996).
45. D. J. Dagel, C. M. Mallouris, and J. R. Doyle, J. Appl. Phys. 79, 8735 (1996).
46. W. L. Gardner, J. Vacuum Sci. Technol. A 14, 1938 (1996).
47. S. Harris and A. M. Weiner, J. Appl. Phys. 67, 6520 (1990).
48. H. Pauser, C. G. Schwärzler, J. Laimer, and H. Störi, Plasma Chem. Plasma Process. 17, 107 (1997).
49. C. G. Schwärzler, O. Schnabl, J. Laimer, and H. Störi, Plasma Chem. Plasma Process. 16, 173 (1996).
50. L. E. Kline, W. D. Partlow, and W. E. Bies, J. Appl. Phys. 65, 70 (1989).
51. M. Frenklach and H. Wang, Phys. Rev. B 43, 1520 (1991).
52. T. Lang, J. Laimer, and H. Störi, Diamond Related Mater. 3, 470 (1994).
53. W. Möller, Appl. Phys. A 56, 527 (1993).
54. D. E. Donohue, J. A. Schiavone, and R. S. Freund, J. Chem. Phys. 67, 769 (1977).
55. G. Y. Alekseev, V. A. Bityrin, A. N. Bocharov, A. V. Levchenko, A. Ohl, and M. Schmidt, Proc. 12th Int. Conf. Gas Discharges and Their Applications, Greifswald, 407 (1997).
56. L. S. Zelson, D. F. Davidson, and R. K. Hanson, J. Quant. Spectrosc. Radiat. Transfer 52, 31 (1994).
57. D. L. Baulch et al., J. Phys. Chem. Ref. Data 21, 411 (1992).
58. C. Brechignac, J. W. Johns, A. R. W. McKellar, and M. Wong, J. Mol. Spectr. 96, 353 (1982).
59. D. G. Murcray, F. J. Murcray, F. S. Bonomo, A. Goldman, and R. D. Blatherwick, "High Resolution Infrared Laboratory Spectra," University of Denver, Department of Chemistry, Denver, Colorado (1984).