130 nm and 150 nm line-and-space critical-dimension control evaluation using XS-1 x-ray stepper

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3509-3514

  Tanaka, Y ^a   Taguchi, T ^a   Fujii, K ^a   Tsuboi, S ^a   Yamabe, M ^a   Suzuki, K ^a   Gomei, Y ^a   Hisatsugu, T ^a   Fukuda, M ^b   Morita, H ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007042663     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590487     Document Type: Review

References (14)

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