Additive-driven phase-selective chemistry in block copolymer thin films: The convergence of top-down and bottom-up approaches

Advanced Materials

Volumn 16, Issue 12, 2004, Pages 953-957

  Du, Phong ^a   Li, Mingqi ^a   Douki, Katsuji ^a,b   Li, Xuefa ^a   Garcia, Carlos B W ^a   Jain, Anurag ^a   Smilgies, Detlef M ^a   Fetters, Lewis J ^a   Gruner, Sol M ^a   Wiesner, Ulrich ^a   Ober, Christopher K ^a  

^a Department of Population Medicine and Diagnostic Sciences   (United States)

^b JSR Micro   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANIONIC POLYMERIZATION; CARRIER CONCENTRATION; CATALYSIS; COMPUTER SIMULATION; CROSSLINKING; ELECTRON BEAMS; LITHOGRAPHY; MOLECULAR SIEVES; MOLECULAR WEIGHT; NANOTECHNOLOGY; PHOTOLYSIS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON WAFERS; THIN FILMS;

FILM SURFACES; MAGNETIC STRUCTURES; OZONOLYSIS; PATTERN FORMATION;

BLOCK COPOLYMERS;

EID: 3142704502     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200306189     Document Type: Article

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