Sub-10 nm lithography with self-assembled monolayers

Applied Physics Letters

Volumn 68, Issue 11, 1996, Pages 1504-1506

  Lercel, M J ^a   Craighead, H G ^a   Parikh, A N ^b   Seshadri, K ^b   Allara, D L ^b  

^a Department of Population Medicine and Diagnostic Sciences   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001654730     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115680     Document Type: Article

References (16)

1. A. N. Broers, IBM J. Res. Dev. 32, 502 (1988).
2. H. G. Craighead, R. E. Howard, L. D. Jackel, and P. M. Mankiewich, Appl. Phys. Lett. 56, 2003 (1990).
3. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
4. A. Murray, M. Scheinfein, M. Isaacson, and I. Adesida, J. Vac. Sci. Technol. B 3, 367 (1985).
5. A. Ulman, An Introduction to Ultra-thin Organic Films: Langmuir-Blodgett to Self-Assembly (Academic, New York, 1991).
6. M. J. Lercel, R. C. Tiberio, P. F. Chapman, H. G. Craighead, C. W. Sheen, A. N. Parikh, and D. L. Allara, J. Vac. Sci. Technol. B 11, 2823 (1993).
7. M. J. Lercel, G. F. Redinbo, H. G. Craighead, C. W. Sheen, and D. L. Allara, Appl. Phys. Lett. 65, 974 (1994).
8. M. J. Lercel, M. Rooks, R. C. Tiberio, H. G. Craighead, C. W. Sheen, A. N. Parikh, and D. L. Allara, J. Vac. Sci. Technol. B 13, 1139 (1995).
9. Root mean square roughness.
10. Digital Instruments Inc. (Santa Barbara, CA).
11. M. Radmacher, R. W. Tillman, M. Fritz, and H. E. Gaub, Science 257, 1900 (1992).
12. S. A. Rishton, S. P. Beaumont, and C. D. W. Wilkinson, J. Phys. E 17, 296 (1984).
13. "Model 486/487 Picoammeter and Picoammeter/Voltage Source Instruction Manual" (Keithley Instruments, Cleveland, OH).
14. D. C. Joy and S. Luo, Scanning 11, 176 (1989).
15. E. Cartier, P. Pfluger, J. J. Pireaux, and M. Rei Vilar, Appl. Phys. A 44, 43 (1987).
16. J. J. Ritsko, J. Chem. Phys. 70, 5343 (1979).