Sub-10 nm lithography with self-assembled monolayers

Applied Physics Letters

Volumn 68, Issue 11, 1996, Pages 1504-1506

  Lercel, M J ^a   Craighead, H G ^a   Parikh, A N ^b   Seshadri, K ^b   Allara, D L ^b  

^a Department of Obstetrics Gynecology   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001654730     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115680     Document Type: Article

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