Using phase mask algorithms to direct self assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Schellenberg, F M ^a   Torres, J A R ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

BCP; Block copolymers; Directed Self Assembly; DSA; LER; Phase shifting lithography

Indexed keywords

DATA PARSING; DIRECTED SELF-ASSEMBLY (DSA); LER; PHASE-SHIFTING LITHOGRAPHY;

ALGORITHMS; BLOCK COPOLYMERS; MASKS; PHASE SHIFT; PLASTIC FILMS;

SELF ASSEMBLY;

EID: 33745608943     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.666922     Document Type: Conference Paper

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