Characterization of low pressure chemical vapor deposited polymeric fluorinated carbon m (C:FX)n thin films with low dielectric constant

Applied Physics A: Materials Science and Processing

Volumn 83, Issue 1, 2006, Pages 57-66

  Rastogi, A C ^a   Desu, S B ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; FLUORINE; PERMITTIVITY; POLYMERS;

FILAMENT DECOMPOSITION; FILAMENT TEMPERATURE; FLUORINATED CARBON; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 32244442850     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-005-3435-6     Document Type: Article

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