Variable angle spectroscopic ellipsometry of fluorocarbon films from hot filament chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2404-2411

  Lau, Kenneth K S ^a   Caulfield, Jeffrey A ^b   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FLUOROCARBONS; PERMITTIVITY; POROSITY;

HEXAFLUOROPROPYLENE OXIDE; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIELECTRIC FILMS;

EID: 0034273947     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1288191     Document Type: Article

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