Effect of sputtering with hydrogen dilution on fluorine concentration of low hydrogen content fluorinated amorphous carbon thin films with low dielectric constant

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2468-2472

  Yokomichi, Haruo ^a   Masuda, Atsushi ^b  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; COMPOSITION EFFECTS; DIELECTRIC FILMS; FLUORINE; HALOGENATION; HYDROGEN; MAGNETRON SPUTTERING; PERMITTIVITY; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS;

FLUORINATED AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0032614202     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371078     Document Type: Article

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