The effects of surface-plasma treatment of thin-film hydrogen silesquioxane low k dielectric

Journal of Materials Science: Materials in Electronics

Volumn 15, Issue 3, 2004, Pages 139-143

  Chen, Chi Tong ^a   Chiou, Bi Shiou ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DENSIFICATION; FIELD EMISSION MICROSCOPES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; HYDROGEN INORGANIC COMPOUNDS; MORPHOLOGY; PERMITTIVITY; REFRACTIVE INDEX; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS; SPIN COATING; THICKNESS MEASUREMENT; ULSI CIRCUITS;

BOND STRUCTURE; PLANARIZATION; SURFACE-PLASMA TREATMENT;

DIELECTRIC FILMS;

EID: 0742268357     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSE.0000011352.95343.8d     Document Type: Article

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