Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

Applied Physics Letters

Volumn 72, Issue 25, 1998, Pages 3353-3355

  Ma, Yanjun ^a   Yang, Hongning ^a   Guo, J ^b   Sathe, C ^b   Agui, A ^b   Nordgren, J ^b  

^a Sharp Microelectronics Technology Inc   (United States)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000683947     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121601     Document Type: Article

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