Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: Film composition study

Journal of Applied Polymer Science

Volumn 67, Issue 8, 1998, Pages 1489-1502

  Limb, Scott J ^a   Edell, David J ^b   Gleason, Edward F ^c   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b HARVARD UNIVERSITY   (United States)

^c MIT LINCOLN LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FLUOROCARBONS; PHASE COMPOSITION; PLASMA APPLICATIONS; POLYTETRAFLUOROETHYLENES; PRESSURE EFFECTS; SUBSTRATES; SURFACE TREATMENT; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

HEXAFLUOROPROPYLENE OXIDE; PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

PLASTIC FILMS;

EID: 0032001704     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19980222)67:8<1489::AID-APP14>3.0.CO;2-X     Document Type: Article

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