Thermal Stability of Fluorinated Amorphous Carbon Thin Films with Low Dielectric Constant

Journal of the Electrochemical Society

Volumn 148, Issue 4, 2001, Pages

  Han, Sang Soo ^a   Bae, Byeong Soo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001792521     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1357181     Document Type: Article

References (14)

1. R. K. Laxman, Semicond. Int., 1995, 71 (May).
2. T. Homma, Mater. Sci. Eng., R23, 243 (1998).
3. T.-M. Lu and J. A. Moore, MRS Bull., 22(10), 28 (1997).
4. L. A. Sullivan and B. Han, Solid State Technol., 39, 91 (1996).
5. P. K. Wu, G.-R. Yang, J. F. Mcdonald, and T.-M. Lu, J. Electron. Mater., 24, 53 (1995).
6. J. A. Moore, C.-I. Lang, T.-M. Lu, and G.-R. Yang, Polym. Mater. Sci. Eng., 72, 437 (1995).
7. N. P. Hacker, MRS Bull., 22, 33 (1997).
8. K. Endo and T. Tasumi, Appl. Phys. Lett., 68, 2864 (1996).
9. A. Grill, V. Patel, and C. Jahnes, J. Electrochem. Soc., 145, 1649 (1998).
10. R. d'Agostino, K. Cramarossa, and F. Illuzzi, J. Appl. Phys., 61, 2754 (1987).
11. Y. Ma, H. Yang, J. Guo, C. Sathe, A. Agui, and J. Nordgren, Appl. Phys. Lett., 72, 3353 (1998).
12. H. Yang, D. J. Tweet, Y. Ma, and T. Nguyen, Appl. Phys. Lett., 73, 1514 (1998).
13. S. Takeishi, H. Kudo, R. Shinohara, M. Hoshino, S. Fukuyama, J. Yamaguchi, and M. Yamada, J. Electrochem. Soc., 144, 1797 (1997).
14. S.-S. Han, H. R. Kim, and B.-S. Bae, J. Electrochem. Soc., 146, 3383 (1999).