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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 1149-1153

Characterization of low permittivity (low-k) polymeric dielectric films for low temperature device integration

(4) Sivoththaman, S a Jeyakumar, R a Ren, L a Nathan, A a

a UNIVERSITY OF WATERLOO (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CAPACITANCE MEASUREMENT; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMAGE PROCESSING; INTEGRATED CIRCUIT MANUFACTURE; LOW TEMPERATURE OPERATIONS; OLEFINS; PARAFFINS; PERMITTIVITY; PLASTIC FILMS; SENSORS; THIN FILM TRANSISTORS;

BENZOCYCLOBUTENE; HIGH FREQUENCY CAPACITANCE VOLTAGE; HYDROGEN SILSESQUIOXANE; INTEGRATED CIRCUIT PROCESSING; LOW TEMPERATURE DEVICE INTEGRATION; PLANARIZATION PROPERTIES; POLYMERIC DIELECTRIC FILMS; SPIN COATED POLYMERIC ORGANIC FILMS; TOPOGRAPHIC PLANARIZATION; WATER DEFLECTION STRESS MEASUREMENT;

DIELECTRIC FILMS;

EID: 0036565067 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1463083 Document Type: Article

Times cited : (21)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.