Characterization of chemical vapor deposited amorphous fluorocarbons for low dielectric constant interlayer dielectrics

Journal of the Electrochemical Society

Volumn 146, Issue 6, 1999, Pages 2219-2224

  Banerjee, Indrajit ^a   Harker, Marnie ^a   Wong, L ^b   Coon, P A ^a   Gleason, Karen K ^c  

^a INTEL CORPORATION   (United States)

^b Portland Technology Development   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CARBON MONOXIDE; DECOMPOSITION; DIELECTRIC MATERIALS; IONS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXYGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW DIELECTRIC CONSTANT INTERLAYER DIELECTRICS; PYROLYTIC DECOMPOSITION;

FLUOROCARBONS;

EID: 0032628899     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391917     Document Type: Article

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