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Journal of Physical Chemistry B

Volumn 105, Issue 12, 2001, Pages 2303-2307

Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition

(2) Lau, Kenneth K S a Gleason, Karen K a

a Massachusetts Institute of Technology Cambridge (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBON FILMS; HEXAFLUOROPROPYLENE OXIDE; HOT FILAMENT CHEMICAL VAPOR DEPOSITION; STRUCTURAL CHANGES;

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MELTING; MORPHOLOGY; OPTICAL MICROSCOPY; PYROLYSIS; QUENCHING; RAPID THERMAL ANNEALING; STRUCTURE (COMPOSITION); TEMPERATURE;

FLUOROCARBONS;

EID: 0035967394 PISSN: 15206106 EISSN: None Source Type: Journal
DOI: 10.1021/jp002347u Document Type: Article

Times cited : (24)

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