Thermal chemical vapor deposition of fluorocarbon polymer thin films in a hot filament reactor

Polymer

Volumn 46, Issue 10, 2005, Pages 3440-3451

  Rastogi, A C ^a   Desu, S B ^a  

^a University of Massachusetts   (United States)

Author keywords

Fluoropolymer films; Polymer CVD; XPS

Indexed keywords

ABSORPTION; ANNEALING; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; INFRARED RADIATION; LINEARIZATION; MOLECULAR STRUCTURE; POLYTETRAFLUOROETHYLENES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION BANDS; CORE LEVEL ELECTRON SPECTROSCOPY; FILM GROWTH TEMPERATURE; THERMAL CHEMICAL VAPOR DEPOSITION;

FLUOROCARBONS;

FILM;

EID: 16244419788     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2004.10.082     Document Type: Article

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