Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters

Volumn 68, Issue 20, 1996, Pages 2864-2866

  Endo, Kazuhiko ^a   Tatsumi, Toru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040400378     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116350     Document Type: Article

References (11)

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