Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits

IBM Journal of Research and Development

Volumn 43, Issue 1-2, 1999, Pages 5-37

  Cote, D R ^a   Nguyen, S V ^a   Stamper, A K ^a   Armbrust, D S ^a   Tobben D ^a   Conti, R A ^a   Lee, G Y ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; INTEGRATED CIRCUIT MANUFACTURE; THIN FILMS; ULSI CIRCUITS;

DIELECTRIC THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032650472     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.431.0005     Document Type: Article

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