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Volumn 40, Issue 3, 1997, Pages 109-114

Dielectric antireflective coatings for DUV lithography

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0037598556     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (20)

References (14)
  • 2
    • 0029342311 scopus 로고
    • Antireflective Coatings - An Overview
    • July
    • T. Perera, "Antireflective Coatings - an Overview," Solid State Technology,Vol. 37, No. 7, pp. 131-136, July 1995.
    • (1995) Solid State Technology , vol.37 , Issue.7 , pp. 131-136
    • Perera, T.1
  • 3
    • 85010122985 scopus 로고
    • Novel ARC Optimization Methodology for KrF Excimer Laser Lithography at Low K1 Factor
    • SPIE
    • T. Ogawa et al., "Novel ARC Optimization Methodology for KrF Excimer Laser Lithography at Low K1 Factor," Optical/Laser Microlithography V, Vol. 1674, SPIE, 1992.
    • (1992) Optical/Laser Microlithography V , vol.1674
    • Ogawa, T.1
  • 4
    • 0027576856 scopus 로고    scopus 로고
    • Reduction of Linewidth Variation for the Gate Conductor Level by Lithography Based on New Antireflective Layer
    • G. Czech et al., "Reduction of Linewidth Variation for the Gate Conductor Level by Lithography Based on New Antireflective Layer," Microelectronic Engineering 21, 1993.
    • Microelectronic Engineering , vol.21 , pp. 1993
    • Czech, G.1
  • 5
    • 85076255622 scopus 로고
    • Practical Resolution Enhancement Effect by New Complete Antireflective Layer in KrF Excimer Laser Lithography
    • SPIE
    • T. Ogawa et al., "Practical Resolution Enhancement Effect by New Complete Antireflective Layer in KrF Excimer Laser Lithography," Optical/Laser Microlithography VI, Vol. 1927, SPIE, 1993.
    • (1993) Optical/Laser Microlithography VI , vol.1927
    • Ogawa, T.1
  • 6
    • 0028199392 scopus 로고
    • Chemical Vapor Deposition of Antireflective Layer Film for Excimer Laser Lithography
    • T. Gocho et al., "Chemical Vapor Deposition of Antireflective Layer Film for Excimer Laser Lithography," Jpn. J. of Appl. Phys., Vol. 33, 1994.
    • (1994) Jpn. J. of Appl. Phys. , vol.33
    • Gocho, T.1
  • 10
  • 11
    • 6144271958 scopus 로고    scopus 로고
    • n&k Analyzer, n&k Technology, Santa Clara, California
    • A.R. Forouhi, I. Bloomer, n&k Analyzer, n&k Technology, Santa Clara, California.
    • Forouhi, A.R.1    Bloomer, I.2
  • 12
    • 0009260463 scopus 로고
    • Optical Dispersion Relations for Amorphous Semiconductors and Amorphous Dielectrics
    • A.R. Forouhi, I. Bloomer, "Optical Dispersion Relations for Amorphous Semiconductors and Amorphous Dielectrics," Phys. Rev. B, p. 7018, 1986.
    • (1986) Phys. Rev. B , pp. 7018
    • Forouhi, A.R.1    Bloomer, I.2
  • 13
    • 0003298966 scopus 로고
    • Optical Characterization of Amorphous and Polycrystalline Silicon Films
    • August
    • E. Ibok et al., "Optical Characterization of Amorphous and Polycrystalline Silicon Films," Solid State Technology, Vol. 38, No. 8, pp. S11-S20, August 1995.
    • (1995) Solid State Technology , vol.38 , Issue.8
    • Ibok, E.1
  • 14
    • 0028444159 scopus 로고
    • The Lithography Tutor: Swing Curves
    • Summer
    • C. A. Mack, "The Lithography Tutor: Swing Curves," Microlithography World, Vol. 3, No. 3, pp. 23-25, Summer 1994.
    • (1994) Microlithography World , vol.3 , Issue.3 , pp. 23-25
    • Mack, C.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.