Substrate effect on plasma-enhanced chemical vapor deposited silicon nitride

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3198-3204

  Sherman, S ^a   Wagner, S ^a   Mucha, J ^b,c   Gottscho, R A ^b,d  

^a Princeton University   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c SEMATECH   (United States)

^d LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHROMIUM; COATED MATERIALS; ETCHING; GLASS; HEAT RADIATION; MATHEMATICAL MODELS; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS;

BUFFERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031233566     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837983     Document Type: Article

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