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Volumn 20, Issue 1, 1997, Pages
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1997: the dawn of quarter micron production
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CMOS INTEGRATED CIRCUITS;
ION IMPLANTATION;
LITHOGRAPHY;
MICROELECTRONIC PROCESSING;
MICROELECTRONICS;
RANDOM ACCESS STORAGE;
SILICON WAFERS;
SPUTTERING;
BACK END OF THE LINE;
CHEMICAL MECHANICAL PLANARIZATION;
FRONT END OF THE LINE;
MEMORY DENSITY;
QUARTER MICRON PROCESSES;
SEMICONDUCTOR INDUSTRY;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0030819325
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (1)
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References (0)
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