Low k dielectrics: The search continues. Fluorinated oxides and polymers offer the potential to reduce the dielectric constant of on-chip insulators

Semiconductor International

Volumn 19, Issue 5, 1996, Pages 88-96

  Singer, Peter ^a  

^a NONE

Author keywords

Fluorinated oxides; Intermetal dielectrics; Low k dielectrics

Indexed keywords

EID: 30844463428     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

1. P. Singer, "Chasing the Promise of Faster Chips," Semiconductor International, November 1994, p. 52.
2. R. Laxman, "Low ε Dielectrics: CVD Fluorinated Silicon Dioxides," Semiconductor International, May 1995, p. 71.
3. J. Leu et al., "Spin-on Low k Dielectric Materials for Deep-Submicron Multilevel Interconnect Applications: Materials Properties and Integration," Allied Signal PLANAR/Asia, January, 1996.
4. X. Zhang et al., "Unterminated Bonds in Parylene-N Films," Semiconductor International, December 1995, p. 89.