Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO2 from SiH4/O2/Ar discharges

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 427-434

  Han, Sang M ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

Attenuated total reflection fourier transform infrared spectroscopy; Intermetal dielectric; Plasma enhanced chemical vapor deposition; Silicon dioxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERMETALLICS; OXIDATION; PLASMA DIAGNOSTICS; SILANES; SILICA; SUBSTRATES; THIN FILMS;

ATTENUATED TOTAL REFLECTION (ATR); LANGMUIR PROBE MEASUREMENTS; OPTICAL EMISSION ACTINOMETRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0030397460     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09024-4     Document Type: Article

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