Deposition and characterization of porous silica xerogel films

Materials Research Society Symposium - Proceedings

Volumn 443, Issue , 1997, Pages 99-104

  Jin, Changming ^a   List, Scott ^a   Yamanaka, Stacey ^a   Lee, Wei William ^a   Taylor, Kelly ^a   Hsu, Wei Yung ^a   Olsen, Leif ^a   Luttmer, J D ^a   Havemann, Robert ^a   Smith, Douglas ^a   Ramos, Teresa ^a   Maskara, Alok ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ASPECT RATIO; CHEMICAL POLISHING; DEPOSITION; ELECTRIC CONNECTORS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; POROSITY; POROUS MATERIALS; PRESSURE EFFECTS; SILICA GEL; TUNGSTEN;

CHEMICAL MECHANICAL POLISHING (CMP); INTERMETAL DIELECTRICS; XEROGEL;

DIELECTRIC FILMS;

EID: 0030716049     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)