Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system

Review of Scientific Instruments

Volumn 68, Issue 12, 1997, Pages 4555-4560

  Green, K M ^a   Hayden, D B ^a   Juliano, D R ^a   Ruzic, D N ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMS; CALCULATIONS; CURVE FITTING; FLUXES; IONIZATION; IONS; MAGNETRONS; PLASMAS; SENSORS; SUBSTRATES;

FLUX IONIZATION FRACTION; GRIDDED ENERGY ANALYZER; QUARTZ CRYSTAL MICROBALANCE;

MAGNETRON SPUTTERING;

EID: 0031387180     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148430     Document Type: Article

References (11)

1. Thin Film Processes, edited by J. L. Vossen and W. Kern (Academic, New York, 1978).
2. VLSI Technology, 2nd ed., edited by S. M. Sze (McGraw-Hill, New York, 1988).
3. National Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 1994).
4. S. M. Rossnagle, D. Mikalsen, H. Kinoshita, and J. J. Cuomo, J. Vac. Sci. Technol. A 9, 261 (1991).
5. P. F. Cheng, S. M. Rossnagel, and D. N. Ruzic, J. Vac. Sci. Technol. B 13, 203 (1995).
6. W. M. Holber, J. S. Logan, H. J. Grabarz, J. T. C. Yeh, J. B. O. Caughman, A. Sugarman, and F. E. Turner, J. Vac. Sci. Technol. A 11, 2903 (1993).
7. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989).
8. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).
9. S. M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12, 449 (1994).
10. D. N. Ruzic, Electric Probes for Low Temperature Plasmas (AVS Monograph Series, New York, 1994).
11. D. B. Hayden, D. N. Ruzic, K. M. Green, D. R. Juliano, C. A. Weiss, K. A. Ashtiani, and T. J. Licata, J. Vac. Sci. Technol. A (submitted).