Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 43, Issue 27, 2010, Pages

  Ehiasarian, Arutiun P ^a   Andersson, Joakim ^b,c   Anders, André ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC MASS; CHARGE EXCHANGES; CHARGE STATE; COMBINED ENERGY; CRIII IONS; DOUBLY CHARGED IONS; HIGH-POWER; ION DENSITY; ION ENERGIES; ION ENERGY DISTRIBUTION FUNCTIONS; PLASMA COMPOSITION; PLASMA GENERATION; QUADRUPOLE MASS SPECTROMETER; SPUTTER YIELDS; SPUTTERING TARGET;

ARGON; CHARGE TRANSFER; CHROMIUM; DISTRIBUTION FUNCTIONS; MASS SPECTROMETRY; METAL IONS; METALS; PLASMAS; SPUTTERING; TITANIUM;

TARGETS;

EID: 77953883115     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/27/275204     Document Type: Article

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