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Volumn 45, Issue 32, 2012, Pages

Ionized metal flux fraction measurements in HiPIMS discharges

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL METHODS; DISCHARGE POWER; FRACTION MEASUREMENTS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); METAL FLUXES; PULSE FREQUENCIES; PULSEWIDTHS; TARGET VOLTAGE; TIME-AVERAGED; TITANIUM TARGETS;

EID: 84864448456     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/32/322001     Document Type: Article
Times cited : (35)

References (25)
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    • Titanium oxide thin films deposited by high-power impulse magnetron sputtering
    • DOI 10.1016/j.tsf.2006.07.089, PII S0040609006009060
    • Konstantinidis S, Dauchot J P and Hecq M 2006 Thin Solid Films 515 1182 (Pubitemid 44767575)
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    • Konstantinidis, S.1    Dauchot, J.P.2    Hecq, M.3
  • 12
    • 33847369879 scopus 로고    scopus 로고
    • Effects of reactive gas addition on ionization of metal atoms in droplet-free metal ion sources
    • DOI 10.1016/j.surfcoat.2006.09.091, PII S0257897206010309, The Eighth International Workshop on Plasma-Based Ion Implantation and Deposition
    • Nakamura K, Wakayama A and Yukimura K 2007 Surf. Coat. Technol. 201 6655 (Pubitemid 46336683)
    • (2007) Surface and Coatings Technology , vol.201 , Issue.15 , pp. 6655-6659
    • Nakamura, K.1    Wakayama, A.2    Yukimura, K.3
  • 19
    • 0347684350 scopus 로고    scopus 로고
    • 10.1238/Physica.Regular.061a00595 1402-4896 013
    • Smirnov B M 2000 Phys. Scr. 61 595
    • (2000) Phys. Scr. , vol.61 , pp. 595
    • Smirnov, B.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.