Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges

Journal of Physics D: Applied Physics

Volumn 46, Issue 10, 2013, Pages

  Kozák, Tomáš ^a   Vlček, Jaroslav ^a   Kos, Šimon ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PRESSURE; COPPER TARGET; DEPOSITION PARAMETERS; DISCHARGE REGIMES; MAGNETIC FIELD STRENGTHS; MAGNETRON SYSTEM; NONSTATIONARY; PHENOMENOLOGICAL MODELS; REPETITION FREQUENCY; SPUTTERED ATOMS; TARGET MATERIALS; TARGET POWER DENSITY; TWO-ZONE MODEL; VOLTAGE PULSE;

ELECTRIC POTENTIAL; MAGNETRON SPUTTERING;

IONIZATION;

EID: 84874046025     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/10/105203     Document Type: Article

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