Tin oxide atomic layer deposition from tetrakis(dimethylamino)tin and water

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 6, 2013, Pages

  Mullings, Marja N ^a   Hägglund, Carl ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX TOPOGRAPHIES; CONTAMINATION LEVELS; INCREASING TEMPERATURES; LOW TEMPERATURE GROWTH; NANOSTRUCTURED SOLAR CELLS; TRANSPARENT CONDUCTORS; TUNABLE OPTICAL PROPERTIES; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

AMORPHOUS MATERIALS; AMORPHOUS SILICON; ATOMIC LAYER DEPOSITION; DEPOSITION; OXIDE MINERALS; PHOTOELECTRONS; SILICON; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; THICK FILMS; TIN; TIN OXIDES; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 84884536996     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4812717     Document Type: Article

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