Atomic layer deposition on suspended single-walled carbon nanotubes via gas-phase noncovalent functionalization

Nano Letters

Volumn 6, Issue 4, 2006, Pages 699-703

  Farmer, Damon B ^a   Gordon, Roy G ^b  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; GAS-PHASE NONCOVALENT FUNCTIONALIZATION; NITROGEN DIOXIDE; SINGLE-WALLED CARBON NANOTUBES;

CHEMICAL BONDS; DEPOSITION; MECHANICAL PROPERTIES; MONOLAYERS; NITROGEN OXIDES;

CARBON NANOTUBES;

ALUMINUM; CARBON NANOTUBE; NITROGEN DIOXIDE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; GAS; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; PHASE TRANSITION; SURFACE PROPERTY; ULTRASTRUCTURE;

ALUMINUM; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; GASES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTUBES, CARBON; NITROGEN DIOXIDE; PARTICLE SIZE; PHASE TRANSITION; SURFACE PROPERTIES;

EID: 33646402623     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl052453d     Document Type: Article

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