A novel top surface imaging approach utilizing direct area selective atomic layer deposition of hard masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Sinha, Ashwini ^a   Hess, Dennis W ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

ALD; Area selective; Atomic layer deposition; Chemically amplified; Resist; Top surface imaging; TSI

Indexed keywords

AREA SELECTIVE; METAL OXIDE PATTERNS; SINGLE POLYMERIC PHOTORESIST FILM; TOP SURFACE IMAGING;

ATOMIC LAYER DEPOSITION; IMAGING TECHNIQUES; NUCLEATION; PHOTORESISTS; PLASMA ETCHING; POLYMER FILMS; TITANIUM COMPOUNDS;

PHOTOMASKS;

ETCHING; MASKING; NUCLEATION; THIN FILMS; TITANIUM COMPOUNDS;

EID: 35148819740     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712458     Document Type: Conference Paper

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