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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2762-2766

Development of tin oxide synthesis by plasma-enhanced chemical vapor deposition

(6) Robbins, Joshua J a Alexander, Robert T a Bai, Mailasu a Huang, Yen Jung a Vincent, Tyrone L a Wolden, Colin A a

a Department of Geology and Geological Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CHEMICAL REACTORS; ELECTRIC CONDUCTIVITY; FILM GROWTH; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL); TIN COMPOUNDS;

TRANSPARENT CONDUCTING OXIDES (TCO);

THIN FILMS;

EID: 0035507275 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1403716 Document Type: Article

Times cited : (13)

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