Deposition of tin oxide into porous silicon by atomic layer epitaxy

Journal of the Electrochemical Society

Volumn 143, Issue 2, 1996, Pages 683-687

  Dücsö, Csaba ^a   Khanh, Nguyen Quoc ^a   Horváth, Zsolt ^a   Bársony, István ^a   Utriainen, Mikko ^b   Lehto, Sari ^b   Nieminen, Minna ^b   Niinistö, Lauri ^b  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMISORPTION; COMPOSITION; DEPOSITION; DIFFUSION; ELLIPSOMETRY; EPITAXIAL GROWTH; POROSITY; POROUS SILICON; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC LAYER EPITAXY; CONFORMAL COATING; ELECTRON PROBE ANALYSIS; FORMATION MECHANISM; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PORES;

SEMICONDUCTING TIN COMPOUNDS;

EID: 0030086051     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836500     Document Type: Article

References (21)

1. L. T. Canham, Appl. Phys. Lett., 57, 1046 (1990).
2. N. M. Kalkhoran, MRS Symp. Proc., 256, 89 (1992).
3. W. Lang, P. Steiner, and F. Kozlowski, J. Lumin, 57, 341 (1993).
4. G. Bomchill, A. Halimaoui, and R. Herino, Microel. Eng., 8, 293 (1988).
5. G. Zhao, H. Y. Huang, and M. Bao, Sens. Act., A21-23, 840 (1990)
6. R. C. Anderson, R. S. Müller, and C. W. Tobias, ibid., A1-23, 835 (1990).
7. M. Jeske, J. W. Schultze, M. Thönissen, and H. Münder, Thin Solid Films, 255, 63 (1995).
8. P. Steiner, F. Kozlowski, and W. Lang, ibid., 255, 49 (1995).
9. Atomic Layer Epitaxy, T. Suntola, and M. Simpson, Editors, Blackie, Glasgow (1990).
10. L. Niinistö and M. Leskel, Thin Solid Films, 222, 130 (1993).
11. Sensors. A Comprehensive Survey in Eight Volumes, Vol. 2, W. Göpel, J. Hesse, and J. N. Zemmel, Editors, VCH, Weinheim (1989).
12. J. Watson, K. Ihokura, and G. S. V. Coles, Meas. Sci. Technol., 4, 711 (1993).
13. N. Yamazoe, Sen. Act., B5, 7(1991).
14. T. S. J. Lammerink, A. van den Berg, and J. H. J. Fluitman, in Proceedings of the Dutch Conference on Sensor Technology, p. 173 (1994).
15. E. Vázsonyi, I. Bársony, T. Lohner, M. Fried, J. Erostyák, M. Rácz, and F. Pászti, MRS Symp. Proc., 358, 653 (1994).
16. H. Viirola and L. Niinistö, Thin Solid Films, 249, 144 (1994).
17. T. Suntola, Mater. Sci. Rep., 7, 261 (1989),
18. M. Knudsen, The Kinetic Theory of Gases, John Wiley & Sons, Inc., New York (1950),
19. P. Clausing, Physica, 9, 65 (1929).
20. S. Dushman, Scientific Foundations of Vacuum Technique, J. M. Lafferty, Editor, John Wiley & Sons, Inc., New York (1962).
21. C. Tsai, K. H. Li, J. Sarathy, S. Shin, J. Campbell, B. K. Hence, and J. M. White, Appl. Phys. Lett., 59, 2814 (1991).