Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition

Nanotechnology

Volumn 19, Issue 4, 2008, Pages

  Kim, Woo Hee ^a   Park, Sang Joon ^a   Son, Jong Yeog ^a   Kim, Hyungjun ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC LAYER DEPOSITION; ETCHING; RUTHENIUM COMPOUNDS; SELF ASSEMBLY;

ALUMINUM OXIDE; RU NANOSTRUCTURE;

NANOSTRUCTURES;

ALUMINUM OXIDE; NANOMATERIAL; OXYGEN; RUTHENIUM;

ARTICLE; CONFORMATION; ELECTRODE; FILM; PARTICLE SIZE; PRIORITY JOURNAL; SURFACE PROPERTY;

EID: 38049062506     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/04/045302     Document Type: Article

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