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Journal of Materials Chemistry

Volumn 22, Issue 11, 2012, Pages 4599-4602

Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas

(3) Heo, Jaeyeong a Kim, Sang Bok a Gordon, Roy G a

a HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL GROWTH; CYCLIC AMIDES; FILM PROPERTIES; GROWTH PER CYCLE; INSULATING FILM;

AMIDES; ATOMIC LAYER DEPOSITION; CONDUCTIVE FILMS; FILM GROWTH; NITRIC OXIDE; OXIDANTS; TIN OXIDES;

TIN;

EID: 84863182677 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm16557k Document Type: Article

Times cited : (49)

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