Atomic layer deposition of ZnO transparent conducting oxides

Applied Surface Science

Volumn 112, Issue , 1997, Pages 216-222

  Yamada, Akira ^a   Sang, Baosheng ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic layer deposition; Photo ALD; Self limiting growth; Transparent conductive oxide; ZnO

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; FILM GROWTH; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; THERMAL EFFECTS; ULTRAVIOLET RADIATION; WATER; ZINC OXIDE;

ATOMIC LAYER DEPOSITION; DIETHYLZINC; ELECTRON MOBILITY; SELF LIMITING GROWTH;

DEPOSITION;

EID: 0031546852     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)01022-7     Document Type: Article

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