Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1828-1830

  Lee, J H ^a   Cho, Y J ^a   Min, Y S ^a   Kim, D ^a   Rhee, S W ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; DEPOSITION; LOW TEMPERATURE EFFECTS; OXYGEN; PLASMA THEORY; STRONTIUM COMPOUNDS;

PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD);

THIN FILMS;

EID: 0036747806     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1500745     Document Type: Article

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