TiCl4 as a precursor in the TiN deposition by ALD and PEALD

Journal of the Electrochemical Society

Volumn 152, Issue 8, 2005, Pages

  Elers, Kai Erik ^a   Winkler, Jerry ^a   Weeks, Keith ^a   Marcus, Steven ^a  

^a ASM AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; COMPOSITION; CONCENTRATION (PROCESS); DEPOSITION; ELECTRIC CONDUCTIVITY; IMPURITIES; REDUCTION; TITANIUM NITRIDE;

ATOMIC LAYER DEPOSITION (ALD); PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD); PRECURSORS; TITANIUM CHLORIDE;

THIN FILMS;

EID: 25644437019     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1938108     Document Type: Article

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