Plasma-enhanced atomic layer deposition of anatase TiO2 Using TiCl4

Journal of Physical Chemistry C

Volumn 113, Issue 37, 2009, Pages 16307-16310

  Kubala, Nicholas G ^a   Rowlette, Pieter C ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; ANATASE TIO; CONFORMAL COVERAGE; FTIR; OH GROUP; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SURFACE TERMINATION; XPS; XRD;

FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMAS; REFRACTIVE INDEX; SEMICONDUCTING ORGANIC COMPOUNDS; TITANIUM DIOXIDE; TITANIUM OXIDES;

PLASMA DEPOSITION;

EID: 70349906100     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp907266c     Document Type: Article

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