Atomic layer deposited thin films for corrosion protection

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Matero, R ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CORROSION PROTECTION; DEPOSITION; ELECTROCHEMISTRY; FILM GROWTH; MULTILAYERS; PROTECTIVE COATINGS; SODIUM CHLORIDE; STAINLESS STEEL; TANTALUM COMPOUNDS; TEMPERATURE; TITANIUM OXIDES;

ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; TANTALUM OXIDE;

THIN FILMS;

EID: 0342955031     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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