Lanthanum-oxide thin films deposited by plasma-enhanced atomic layer deposition

Journal of the Korean Physical Society

Volumn 49, Issue 3, 2006, Pages 1243-1246

  Lee, Eun Joo ^a   Ko, Myoung Gyun ^a   Kim, Beom Yong ^a   Park, Sang Kyun ^a   Kim, Heon Do ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

High k gate oxide; Lanthanum oxide; Plasma enhanced atomic layer deposition

Indexed keywords

EID: 33749844032     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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