Advanced precursor development for Sr and Ti based oxide thin film applications

ECS Transactions

Volumn 25, Issue 4, 2009, Pages 217-230

  Katamreddy, R ^a   Wang, Z ^a   Omarjee, V ^a   Rao, P Venkateswara ^a   Dussarrat, C ^a   Blasco, N ^a  

^a AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; HYDROSTATIC PRESSURE; MELTING POINT; OXIDE MINERALS; THERMOOXIDATION; TITANIUM DIOXIDE;

CARBON REMOVAL; CYCLOPENTADIENYL PRECURSOR; CYCLOPENTADIENYLS; HETEROLEPTIC; HIGH MELTING POINT; LOW MELTING POINT; LOW VAPOR PRESSURES; OXIDE THIN FILMS;

STRONTIUM COMPOUNDS;

EID: 74249092442     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3205057     Document Type: Conference Paper

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